Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Practical Photomask Linewidth Measurement

Published

Author(s)

James E. Potzick
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control
Volume
1261
Conference Dates
March 5-6, 1990
Conference Location
San Jose, CA

Citation

Potzick, J. (1990), Practical Photomask Linewidth Measurement, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control, San Jose, CA (Accessed November 11, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 1990, Updated February 17, 2017