Potzick, J.
(1990),
Practical Photomask Linewidth Measurement, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control, San Jose, CA
(Accessed July 2, 2025)
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Practical Photomask Linewidth Measurement
Published
Author(s)
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control
Volume
1261
Conference Dates
March 5-6, 1990
Conference Location
San Jose, CA
Pub Type
Conferences
Citation
Issues
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Created December 31, 1990, Updated February 17, 2017