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Practical Photomask Linewidth Measurement

Published

Author(s)

James E. Potzick
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control
Volume
1261
Conference Dates
March 5-6, 1990
Conference Location
San Jose, CA

Citation

Potzick, J. (1990), Practical Photomask Linewidth Measurement, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control, San Jose, CA (Accessed July 19, 2024)

Issues

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Created December 31, 1990, Updated February 17, 2017