The potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) into a high resolution field emission scanning electron microscope (SEM) are substantial for MEMS inspection and metrology. An instrument of this type is currently being tested at the National Institute of Standards and Technology. This instrument will be used in the development of NIST traceable standards for dimensional metrology at the nanometer level. The combination of the two microscopic techniques facilitates: high precision probe placement, the capability of measuring and monitoring the probe geometry, monitoring the scanning of the probe across the feature of interest and an ability for comparative microscopy. The integration of the commercial instrument is the first step in the development of a custom NIST integrated SEM/SxM metrology instrument (with the x variable depending upon the type of probe being used). This paper presents early results regarding the integration of the two instruments and the application of these instruments to the development of SRM 2090 and the prototype SEM sharpness standard.
Proceedings Title: Proceedings of SPIE, Microlithography and Metrology in Micromachining III, Craig R. Friedrich, Akira Umeda, Editors
Conference Dates: September 29, 1997
Conference Location: Austin, TX
Conference Title: Metrology and Tools in Microfabrication II
Pub Type: Conferences
atomic force microscope, metrology, proximal probe microscope, resolution, scanning electron microscope, scanning tunneling microscope, standard reference materials, standards