Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silcon Wafers

Published

July 1, 1999

Author(s)

Thomas A. Germer, Li Piin Sung

Abstract

This article outlines theoretical and experimental results for polarized light scattering from five different sample configurations: surface roughness of a single interface, defects below a single interface, spherical particles above a single surface, spherical particles above a dielectric film, and roughness of the top interface of a dielectric film. These measurements demonstrate that po-larized light scattering can be used to characterized defects on surfaces, pro-vided sufficient information is available about the system without defects. It is found that measurement of the principal direction of the polarization for p-polarized incident light, h(p), when measured out of the plane of incidence, can be used to distinguish amongst light scattered by micro roughness, subsurface defects, and particulate contaminants

Citation

Conference on Electromagnetic and Light Scattering by Nonspherical Particles: Theory and Application

Volume

4

Pub Type

Journals

Keywords

dielectric films, microroughness, particles, polarimetry, scatter, subsurface, surface

Citation

Germer, T. and Sung, L. (1999), Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silcon Wafers, Conference on Electromagnetic and Light Scattering by Nonspherical Particles: Theory and Application (Accessed April 26, 2024)