A review is given of the physical basis for quantitative surface analysis by Auger electron spectroscopy (AES) and by X-ray photoelectron spectroscopy (XPS) or electron spectroscopy for chemical analysis (ESCA). The principal topics discussed are: the feasibility of surface analysis, approaches to surface analysis, description of models and data for surface analysis by AES and XPS, analytical methods, intensity measurements, practical consideration, applications and reference materials.
Proceedings Title: Quantitative surface analysis of materials : a symposium
Conference Dates: March 2-3, 1977
Conference Location: Cleveland, OH
Conference Title: Quantitative surface analysis of materials
Pub Type: Conferences