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The Physica B&Cl Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

Published

Author(s)

Cedric J. Powell

Abstract

A review is given of the physical basis for quantitative surface analysis by Auger electron spectroscopy (AES) and by X-ray photoelectron spectroscopy (XPS) or electron spectroscopy for chemical analysis (ESCA). The principal topics discussed are: the feasibility of surface analysis, approaches to surface analysis, description of models and data for surface analysis by AES and XPS, analytical methods, intensity measurements, practical consideration, applications and reference materials.
Proceedings Title
Quantitative surface analysis of materials : a symposium
Volume
643
Conference Dates
March 2-3, 1977
Conference Location
Cleveland, OH
Conference Title
Quantitative surface analysis of materials

Citation

Powell, C. (1978), The Physica B&Cl Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy, Quantitative surface analysis of materials : a symposium , Cleveland, OH (Accessed July 22, 2024)

Issues

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Created January 1, 1978, Updated February 19, 2017