Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Overview of NIST Metrology Development for the Semiconductor Industry

Published

Author(s)

Stephen Knight

Abstract

The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension metrology, gate dielectric characterization, interconnect materials evaluation, wafer surface inspection, mass flow controller calibration, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.
Issue
0-7803-787
Conference Dates
September 23-27, 2003
Conference Location
Charleston, SC
Conference Title
11th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2003

Keywords

critical dimension, dielectric, interconnect, lithography, manufacturing, metrology

Citation

Knight, S. (2003), Overview of NIST Metrology Development for the Semiconductor Industry, 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2003, Charleston, SC (Accessed April 24, 2024)
Created September 23, 2003, Updated January 27, 2020