Knight, S.
(2003),
Overview of NIST Metrology Development for the Semiconductor Industry, 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2003, Charleston, SC
(Accessed July 26, 2024)
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Overview of NIST Metrology Development for the Semiconductor Industry
Published
Author(s)
Abstract
The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension metrology, gate dielectric characterization, interconnect materials evaluation, wafer surface inspection, mass flow controller calibration, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.Issue
0-7803-787
Conference Dates
September 23-27, 2003
Conference Location
Charleston, SC
Conference Title
11th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2003
Pub Type
Conferences
Keywords
critical dimension, dielectric, interconnect, lithography, manufacturing, metrology
Citation
Issues
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Created September 23, 2003, Updated January 27, 2020