NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Optimizing noise for defect analysis with through-focus scanning optical microscopy

Published

Author(s)

Ravikiran Attota, John A. Kramar
Proceedings Title
SPIE Advanced Lithography
Conference Dates
February 21-25, 2016
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography
Pub Type
Conferences

Download Paper

Local Download

Keywords

TSOM, nanometrology, optical metrology, far-filed imaging, through-focus scanning optical microscopy
Metrology and Nanometrology

Citation

Attota, R. and Kramar, J. (2016), Optimizing noise for defect analysis with through-focus scanning optical microscopy, SPIE Advanced Lithography, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920308 (Accessed October 16, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created March 25, 2016, Updated February 19, 2017
Was this page helpful?