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Optimizing noise for defect analysis with through-focus scanning optical microscopy

Published

Author(s)

Ravikiran Attota, John A. Kramar
Proceedings Title
SPIE Advanced Lithography
Conference Dates
February 21-25, 2016
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography

Keywords

TSOM, nanometrology, optical metrology, far-filed imaging, through-focus scanning optical microscopy

Citation

Attota, R. and Kramar, J. (2016), Optimizing noise for defect analysis with through-focus scanning optical microscopy, SPIE Advanced Lithography, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920308 (Accessed April 23, 2024)
Created March 25, 2016, Updated February 19, 2017