Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standard reference materials and artifacts. We present the standards development effort at NIST and explain the unique capabilities of the new optical overlay metrology instrument.
Proceedings Title: Proceedings of KLA Microlithography Seminar
Conference Dates: January 1, 1996
Conference Location: Gaithersburg, MD
Pub Type: Conferences
optics, overlay metrology, overlay standards, stepped microcone, tool induced shift