Kolmakov, A.
and Tselev, A.
(2020),
Operando Scanning Electron and Microwave Microscopies in Plasmas: A Comparative Analysis, Microscopy and Microanalysis, Milwaukee, WI, [online], https://doi.org/10.1017/S1431927620021790
(Accessed October 8, 2024)
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Operando Scanning Electron and Microwave Microscopies in Plasmas: A Comparative Analysis
Published
Author(s)
, Alexander Tselev
Abstract
There exists a great need for an operando nanoscale characterization of evolution of surface composition and morphology during plasma-assisted processing. This includes sputter deposition, plasma-assisted etching, plasma-enhanced atomic layer deposition and other processes relevant for semiconductor and aerospace industries, environmental remediation, and biomedical technology. Recently, we proposed near-field scanning-probe-based microwave imaging as a tool to image surfaces immediately (a few seconds) after plasma processing with a sub-100 nm spatial resolution. In this communication, we report on true operando near-field microwave imaging in plasma and its extension to imaging in SEM.Proceedings Title
Microscopy and Microanalysis
Volume
26
Issue
S2
Conference Dates
August 2-6, 2020
Conference Location
Milwaukee, WI
Conference Title
Microscopy and Microanalysis 2020
Pub Type
Conferences
Download Paper
Keywords
Operando SEM, microwave microscopy, plasma environment
Citation
Issues
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Created July 29, 2020, Updated December 2, 2020