Operando Scanning Electron and Microwave Microscopies in Plasmas: A Comparative Analysis
Andrei A. Kolmakov, Alexander Tselev
There exists a great need for an operando nanoscale characterization of evolution of surface composition and morphology during plasma-assisted processing. This includes sputter deposition, plasma-assisted etching, plasma-enhanced atomic layer deposition and other processes relevant for semiconductor and aerospace industries, environmental remediation, and biomedical technology. Recently, we proposed near-field scanning-probe-based microwave imaging as a tool to image surfaces immediately (a few seconds) after plasma processing with a sub-100 nm spatial resolution. In this communication, we report on true operando near-field microwave imaging in plasma and its extension to imaging in SEM.
and Tselev, A.
Operando Scanning Electron and Microwave Microscopies in Plasmas: A Comparative Analysis, Microscopy and Microanalysis, Milwaukee, WI, [online], https://doi.org/10.1017/S1431927620021790
(Accessed December 1, 2021)