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The Nucleation of Atomic Layer Deposited HfO2 Films, and Evolution of Their Microstruture, Studied by Grazing Incidence Small Angle X-ray Scattering Using Synchrotron Radiation

Published

Author(s)

Martin L. Green, Andrew J. Allen, Xiang Li, Junling Wang, J Ilavsky, A Delabie, R Puurunen, B Brijs
Citation
Applied Physics Letters
Volume
88
Issue
3

Citation

Green, M. , Allen, A. , Li, X. , Wang, J. , Ilavsky, J. , Delabie, A. , Puurunen, R. and Brijs, B. (2006), The Nucleation of Atomic Layer Deposited HfO2 Films, and Evolution of Their Microstruture, Studied by Grazing Incidence Small Angle X-ray Scattering Using Synchrotron Radiation, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854304 (Accessed June 18, 2024)

Issues

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Created January 16, 2006, Updated February 19, 2017