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A Novel Multilayer Circuit Process Using YBa2Cu3Ox/SrTiO2 Thin Films Patterned by Wet Etching and Ion Milling

Published

Author(s)

H. Q. Li, Ronald H. Ono, Leila R. Vale, David A. Rudman, Sy-Hwang Liou
Citation
Applied Physics Letters
Volume
69
Issue
18

Citation

Li, H. , Ono, R. , Vale, L. , Rudman, D. and Liou, S. (1996), A Novel Multilayer Circuit Process Using YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub>/SrTiO<sub>2</sub> Thin Films Patterned by Wet Etching and Ion Milling, Applied Physics Letters (Accessed July 22, 2024)

Issues

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Created September 30, 1996, Updated October 12, 2021