TY  - JOUR
AU  - Li, H.
AU  - Ono, Ronald
AU  - Vale, Leila
AU  - Rudman, David
AU  - Liou, Sy-hwang
C2  - Applied Physics Letters
DA  - 1996-10-01 00:10:00
LA  - en
M1  - 69
PB  - Applied Physics Letters
PY  - 1996
TI  - A Novel Multilayer Circuit Process Using YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub>/SrTiO<sub>2</sub> Thin Films Patterned by Wet Etching and Ion Milling
ER  -