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Noninvasive monitoring of ion current and ion energy during plasma processing

Published

Author(s)

Mark A. Sobolewski

Abstract

A technique has been developed for noninvasive monitoring of ion energy and ion current in plasma reactors. The technique relies on measurements of the applied rf bias current and voltage, which are interpreted using a fundamental, physical model of the plasma and its sheaths. By fitting the model to measured electrical waveforms, the technique determines the total ion current, the plasma potential and sheath voltage waveforms, and the ion energy distributions.
Proceedings Title
19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases
Conference Dates
July 15-19, 2008
Conference Location
Granada,

Keywords

ion current, ion energy, electrical measurements, inductively coupled, plasma, plasma processing, process monitoring, radio-frequency bias, sheaths

Citation

Sobolewski, M. (2008), Noninvasive monitoring of ion current and ion energy during plasma processing, 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases, Granada, (Accessed March 4, 2024)
Created July 15, 2008, Updated March 29, 2017