Sobolewski, M.
(2008),
Noninvasive monitoring of ion current and ion energy during plasma processing, 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases, Granada,
(Accessed April 3, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Noninvasive monitoring of ion current and ion energy during plasma processing
Published
Author(s)
Abstract
A technique has been developed for noninvasive monitoring of ion energy and ion current in plasma reactors. The technique relies on measurements of the applied rf bias current and voltage, which are interpreted using a fundamental, physical model of the plasma and its sheaths. By fitting the model to measured electrical waveforms, the technique determines the total ion current, the plasma potential and sheath voltage waveforms, and the ion energy distributions.Proceedings Title
19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases
Conference Dates
July 15-19, 2008
Conference Location
Granada,
Pub Type
Conferences
Keywords
ion current, ion energy, electrical measurements, inductively coupled, plasma, plasma processing, process monitoring, radio-frequency bias, sheaths
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created July 15, 2008, Updated March 29, 2017