Powell, C.
and Jablonski, A.
(2002),
The NIST Electron Effective-Attenuation-Length Database, Other, National Institute of Standards and Technology, Gaithersburg, MD
(Accessed November 28, 2025)
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The NIST Electron Effective-Attenuation-Length Database
Published
Author(s)
, Aleksander Jablonski
Abstract
The NIST Electron Effective-Attenuation-Length Database provides values of electron effective attenuation lengths (EALs) in solid elements and compounds at selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for applications in surface analysis by Auger-electron spectroscopy (AES) and X-ray photoelectron spectrscopy (XPS). For these applications, EALs are needed mainly for measurements of the thicknesses of overlayer films and to a much lesser extent for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions speciified by the user. The database also provides values of other parameters needed for other quantitative applications of AES and XPS.Citation
OTHER -
NIST Pub Series
Pub Type
NIST Pubs
Keywords
auger electron spectroscopy, effective attenuation length, elastic-electron scattering, electron, film thickness, inelastic-electron scattering, X-ray photoelectron spectroscopy
Citation
Issues
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Created February 1, 2002, Updated February 19, 2017