Dowell, M.
, Jones, R.
, Laabs, H.
, Cromer, C.
and Morton, R.
(2002),
New Developments in Excimer Laser Metrology at 157 nm, Proc., SPIE, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J.C. Herr, Editor, Santa Clara, CA, USA
(Accessed October 3, 2024)