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New Developments in Excimer Laser Metrology at 157 and 193 nm

Published

Author(s)

Marla L. Dowell, Richard D. Jones, Holger Laabs, Christopher L. Cromer

Abstract

Abstract for oral presentation on NIST 157 nm laser measurement facility.
Proceedings Title
Proc., Intl. Symp. on 157 nm Laser Measurements
Conference Dates
October 3-4, 2001
Conference Location
Ft. Lauderdale, FL, USA

Keywords

laser measurements, lithography

Citation

Dowell, M. , Jones, R. , Laabs, H. and Cromer, C. (2002), New Developments in Excimer Laser Metrology at 157 and 193 nm, Proc., Intl. Symp. on 157 nm Laser Measurements, Ft. Lauderdale, FL, USA (Accessed June 16, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 10, 2002, Updated October 12, 2021