Neuroelectronic Device Process Development and Challenge

Published

March 16, 2017

Author(s)

Jessie Zhang, Gymama Slaughter, Matthew Robinson, Joel Tyson

Abstract

One of the major challenges of brain activity monitoring is to obtain high quality signals from the brain using metal electrodes. The probes consisting of metal electrodes have to be thin enough without damaging the tissue while maintaining good contact to enable the acquisition of high quality signals. In addition, simultaneously collecting multiple data from multiple brain depths and sites remain a huge challenge. In this paper, we will discuss the design, development and fabrication of a fully integrated neuroelectronic prototype device that overcomes these challenges and is capable of simultaneous measurement in multiple locations while maintaining good electrical continuity.

Proceedings Title

Proceedings of SPIE, Optical Microlithography XXX

Volume

101470W

Conference Dates

February 26-March 2, 2017

Conference Location

San Jose, CA, US

Pub Type

Conferences

Download Paper

https://doi.org/10.1117/12.2256297

Local Download

Keywords

neuroelectronics device, design, fabrication

Citation

Zhang, J. , Slaughter, G. , Robinson, M. and Tyson, J. (2017), Neuroelectronic Device Process Development and Challenge, Proceedings of SPIE, Optical Microlithography XXX, San Jose, CA, US, [online], https://doi.org/10.1117/12.2256297, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=921683 (Accessed October 16, 2025)