Zhang, J.
, Slaughter, G.
, Robinson, M.
and Tyson, J.
(2017),
Neuroelectronic Device Process Development and Challenge, Proceedings of SPIE, Optical Microlithography XXX, San Jose, CA, US, [online], https://doi.org/10.1117/12.2256297, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=921683
(Accessed April 23, 2024)
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Neuroelectronic Device Process Development and Challenge
Published
Author(s)
, Gymama Slaughter, , Joel Tyson
Abstract
One of the major challenges of brain activity monitoring is to obtain high quality signals from the brain using metal electrodes. The probes consisting of metal electrodes have to be thin enough without damaging the tissue while maintaining good contact to enable the acquisition of high quality signals. In addition, simultaneously collecting multiple data from multiple brain depths and sites remain a huge challenge. In this paper, we will discuss the design, development and fabrication of a fully integrated neuroelectronic prototype device that overcomes these challenges and is capable of simultaneous measurement in multiple locations while maintaining good electrical continuity.Proceedings Title
Proceedings of SPIE, Optical Microlithography XXX
Volume
101470W
Conference Dates
February 26-March 2, 2017
Conference Location
San Jose, CA, US
Pub Type
Conferences
Download Paper
Keywords
neuroelectronics device, design, fabrication
Citation
Created March 16, 2017, Updated April 7, 2022