Neuroelectronic Device Process Development and Challenge

Published: March 17, 2017

Author(s)

Chen Zhang, Gymama Slaughter, Matthew Robinson, Joel Tyson

Abstract

One of the major challenges of brain activity monitoring is to obtain high quality signals from the brain using metal electrodes. The probes consisting of metal electrodes have to be thin enough without damaging the tissue while maintaining good contact to enable the acquisition of high quality signals. In addition, simultaneously collecting multiple data from multiple brain depths and sites remain a huge challenge. In this paper, we will discuss the design, development and fabrication of a fully integrated neuroelectronic prototype device that overcomes these challenges and is capable of simultaneous measurement in multiple locations while maintaining good electrical continuity.
Proceedings Title: Proceedings of SPIE, Optical Microlithography XXX
Volume: 101470W
Conference Dates: February 26-March 2, 2017
Conference Location: San Jose, CA
Pub Type: Conferences

Keywords

neuroelectronics device, design, fabrication
Created March 17, 2017, Updated November 10, 2018