Near-theoretical fracture strengths in native and oxidized silicon nanowires
Frank W. DelRio, Ryan M. White, Sergiy Krylyuk, Albert Davydov, Lawrence H. Friedman, Robert F. Cook
In this letter, fracture strengths σf of native and oxidized silicon nanowires (SiNWs) were determined via atomic force microscopy bending experiments and nonlinear finite element analysis. In the native SiNWs, σf in the Si was comparable to the theoretical strength of Si〈111〉, ≈22 GPa. In the oxidized SiNWs, σf in the SiO2 was comparable to the theoretical strength of SiO2, ≈6 to 12 GPa. The results indicate a change in the failure mechanism between native SiNWs, in which fracture originated via inter-atomic bond breaking or atomic-scale defects in the Si, and oxidized SiNWs, in which fracture initiated from surface roughness or nano-scale defects in the SiO2.
, White, R.
, Krylyuk, S.
, Davydov, A.
, Friedman, L.
and Cook, R.
Near-theoretical fracture strengths in native and oxidized silicon nanowires, Nanotechnology, [online], https://doi.org/10.1088/0957-4484/27/31/31LT02
(Accessed December 11, 2023)