Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Mesoporous Silica Films with Long-Range Order Prepared from Strongly Segregated Block Copolymer/Homopolymer Blend Templates

Published

Author(s)

Vijay Tirumala, R A. Pai, Sumit Agarwal, Curran Chandler, Gaurav Bhatnagar, Alvin Omang, Eric K. Lin, J J. Watkins

Abstract

Well ordered mesoporous silica films were prepared by infusion and selective condensation of Si alkoxides within pre-organized block copolymer/homopolymer blend templates using supercritical CO2 as the delivery medium. The morphologies of mesoporous silica films reflect improvements in the long range order of poly (ethylene oxide-b-propylene oxide-b-ethylene oxide) triblock copolymer film templates imparted by blending with selectively associating homopolymers such as poly (acrylic acid) or poly (4- hydroxystyrene) prior to alkoxide infusion. Control over film porosity, pore ordering, and morphology of mesoporous silica films is achieved through simple variations in the homopolymer concentration. The films were characterized using x-ray reflectivity, small angle x-ray scattering and transmission electron microscopy.
Citation
Chemistry of Materials
Volume
19
Issue
24

Keywords

block copolymers, homopolymers, long-range order, mesoporous silica, nanotechnology, supercritical carbon dioxide

Citation

Tirumala, V. , Pai, R. , Agarwal, S. , Chandler, C. , Bhatnagar, G. , Omang, A. , Lin, E. and Watkins, J. (2007), Mesoporous Silica Films with Long-Range Order Prepared from Strongly Segregated Block Copolymer/Homopolymer Blend Templates, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852651 (Accessed November 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 24, 2007, Updated February 19, 2017