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Manipulating Morphology and Orientation in Thermally-Responsive Block Copolymer Thin Films

Published

Author(s)

Jennifer Y. Kelly, Julie N. Albert, John A. Howarter, Christopher M. Stafford, Thomas H. Epps, Michael J. Fasolka
Citation
Journal of Polymer Science Part B-Polymer Physics
Volume
50
Issue
4

Keywords

block copolymer, solvent annealing, surface chemistry, gradient, high-throughput, morphology, orientation, thin film, film thickness, thermal deprotection, nanostructure.
Created December 4, 2011, Updated February 19, 2017