Kraft, M.
, Elmquist, R.
, Rietveld, G.
, van, J.
, Mortara, A.
and Jeckelmann, B.
(2016),
Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Traveling Behavior, IEEE Transactions on Instrumentation and Measurement
(Accessed April 26, 2024)
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Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Traveling Behavior
Published
Author(s)
, , Gert Rietveld, Jan van der Beek, Alessandro Mortara, Beat Jeckelmann
Abstract
The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium, National Institute of Standards and Technology, and the Federal Office of Metrology (METAS) were compared using a set of resistors with values 100 mΩ, 10 mΩ, 1 mΩ, and 100 μΩ, respectively. The measurement results of the three laboratories agree extremely well within the respective measurement uncertainties with the comparison reference value. Careful transport of the resistors was crucial for achieving this result. Still, some of the resistors showed steps in value at each transport which likely relates to the construction of the resistance elements of these resistors.Citation
IEEE Transactions on Instrumentation and Measurement
Volume
62
Issue
6
Pub Type
Journals
Keywords
comparison, low-ohmic measurements, precision measurements, resistance measurements, resistors, shunts, traveling behavior
Citation
Created March 1, 2016, Updated February 19, 2017