Suehle, J.
and Chaparala, P.
(1997),
Low Electric Field Breakdown of Thin SiO<sub>2</sub> Films under Static and Dynamic Stress, IEEE Transactions on Electron Devices
(Accessed December 21, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Low Electric Field Breakdown of Thin SiO2 Films under Static and Dynamic Stress
Published
Author(s)
, P Chaparala
Citation
IEEE Transactions on Electron Devices
Volume
44
Issue
5
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created April 30, 1997, Updated October 12, 2021