Suehle, J.
and Chaparala, P.
(1997),
Low Electric Field Breakdown of Thin SiO<sub>2</sub> Films under Static and Dynamic Stress, IEEE Transactions on Electron Devices
(Accessed March 16, 2025)
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Low Electric Field Breakdown of Thin SiO2 Films under Static and Dynamic Stress
Published
Author(s)
, P Chaparala
Citation
IEEE Transactions on Electron Devices
Volume
44
Issue
5
Pub Type
Journals
Citation
Issues
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Created April 30, 1997, Updated October 12, 2021