Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Keeping Analytical Tools in Line with NTRS Goals: An Industry Challenge

Published

Author(s)

Thomas J. Shaffner

Abstract

As we enter the gigabit dynamic random access memory (DRAM) era, stringent demands for higher performance materials characterization are prematurely pushing sophisticated and costly metrology tools into the manufacturing environment. In a climate of limited resources, one must learn to identify which of these tools are in the critical path of IC development and manufacturing. The SIA National Technology Roadmap for Semiconductors (NTRS) provides a framework from which to start. As useful as these roadmaps are, the analytical laboratory manager must still plan his or her specific laboratory plan of action, relative to cycle time, available resources, and critical needs in pursuit of overall fab productivity optimization, yield maximization, and alignment with the NTRS.
Citation
Solid State Technology
Volume
1999
Issue
1

Keywords

characterization, cost, critical path, cycle time, FIB, metrology, NTRS, SIMS, TEM

Citation

Shaffner, T. (1999), Keeping Analytical Tools in Line with NTRS Goals: An Industry Challenge, Solid State Technology (Accessed May 26, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1999, Updated February 17, 2017