Shaffner, T.
(1999),
Keeping Analytical Tools in Line with NTRS Goals: An Industry Challenge, Solid State Technology
(Accessed June 1, 2024)
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Keeping Analytical Tools in Line with NTRS Goals: An Industry Challenge
Published
Author(s)
Abstract
As we enter the gigabit dynamic random access memory (DRAM) era, stringent demands for higher performance materials characterization are prematurely pushing sophisticated and costly metrology tools into the manufacturing environment. In a climate of limited resources, one must learn to identify which of these tools are in the critical path of IC development and manufacturing. The SIA National Technology Roadmap for Semiconductors (NTRS) provides a framework from which to start. As useful as these roadmaps are, the analytical laboratory manager must still plan his or her specific laboratory plan of action, relative to cycle time, available resources, and critical needs in pursuit of overall fab productivity optimization, yield maximization, and alignment with the NTRS.Citation
Solid State Technology
Volume
1999
Issue
1
Pub Type
Journals
Keywords
characterization, cost, critical path, cycle time, FIB, metrology, NTRS, SIMS, TEM
Citation
Issues
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Created January 1, 1999, Updated February 17, 2017