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Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography

Published

Author(s)

John H. Burnett, Zachary H. Levine, E L. And shirley
Citation
Semiconductor Fabtech 15<sup>th</sup> Edition
Publisher Info
ICG Publishing , London,

Citation

Burnett, J. , Levine, Z. and And, E. (2002), Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography, ICG Publishing , London, (Accessed May 24, 2024)

Issues

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Created January 1, 2002, Updated February 17, 2017