In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and the measurement methods applied for traceable linewidth metrology at NIST and PTB.
Proceedings Title: Proceedings SPIE Photomask 2008 (BACUS)
Conference Dates: October 6-10, 2008
Conference Location: Monterey, CA
Pub Type: Conferences
linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA