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Interim Report on Single Crystal Critical Dimension Reference Materials (SCCDRM)

Published

Author(s)

Ronald G. Dixson, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Brandon Park, Christine E. Murabito, Joaquin (. Martinez

Abstract

The single crystal critical dimension reference materials (SCCDRM) project has been completed, and the samples for the SEMATECH member companies have been released for distribution.  The final technology transfer report is currently undergoing revision and review at NIST and is expected to be released in November.  The purpose of this interim report is to disseminate results and information pertaining to the use of the SCCDRM samples to the SEMATECH member companies prior to completion of the final report.The distributed SCCDRM samples were patterned with the NIST45 mask which featured variable linewidth grids (VLG) targets.  These patterns were measured by critical dimension atomic force microscopy (CD-AFM) using the Veeco Dimension X3D  at SEMATECH.  Three chips were chosen to serve as transfer samples, and these were cross-sectioned and measured using high resolution transmission electron microscopy (HR-TEM).  The TEM results ultimately serve to provide the reference calibration for the CD-AFM tip width. Depending upon feature quality, up to six widths are quoted per sample.  In general, the feature widths ranged from approximately 80 nm to 250 nm, and the expanded (k=2) uncertainties [1] are expected to ultimately fall in the 2 nm to 4 nm range.  However, for purposes of this interim document, we are conservatively reporting the uncertainties   and the final values may be revised downward.  We are continuing to refine the uncertainty analysis and data from a fourth transfer chip is currently being evaluated. The measurement methodology, transfer curve, and uncertainty analysis will be described in detail in the final report.  This document provides only basic navigational information, the measured width values for each chip, and the interim uncertainties.  It is important to note that while we expect to revise the expanded uncertainties, the reported width values are not expected to change significantly.
Proceedings Title
SEMATECH Internal Report
Conference Dates
January 1, 2004
Conference Location
Unknown, TX
Conference Title
SEMATECH

Keywords

calibration linewidth, CD, metrology

Citation

Dixson, R. , Cresswell, M. , Allen, R. , Guthrie, W. , Park, B. , Murabito, C. and Martinez, J. (2004), Interim Report on Single Crystal Critical Dimension Reference Materials (SCCDRM), SEMATECH Internal Report, Unknown, TX (Accessed June 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2004, Updated June 2, 2021