Evans, C.
, Parks, R.
, Shao, L.
, Schmitz, T.
and Davies, A.
(2001),
Interferometric Testing of Photomask Blank Flatness, SPIE International Symposium on Microlithography, Santa Clara, CA (Accessed June 14, 2026)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Interferometric Testing of Photomask Blank Flatness
Published
Author(s)
, , L Z. Shao, ,
Abstract
Conventional interferometric testing of the flatness of photomask blanks is rendered difficult by the long coherence length of the HeNe laser sources typically used in commercially available phase measuring interferometers appropriate for flatness testing. The Ritchey-Common configuration allows testing of flats in spherical wavefront; this paper shows that, under appropriate conditions, high resolution surface flatness maps of photomask blanks may be obtained using instrumentation currently available in many optical shops.Proceedings Title
SPIE International Symposium on Microlithography
Volume
4344
Conference Dates
February 26-28, 2001
Conference Location
Santa Clara, CA
Conference Title
International Symposium on Microlithography
Pub Type
Conferences
Keywords
flatness, interfermetry, photomasks, Ritchey-Common test
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created February 28, 2001, Updated February 19, 2017