TY  - CONF
AU  - Christopher Evans
AU  - R Parks
AU  - L Shao
AU  - Tony Schmitz
AU  - Angela Davies
C2  - SPIE International Symposium on Microlithography, Santa Clara, CA
DA  - 2001-02-28
LA  - en
M1  - 4344
PB  - SPIE International Symposium on Microlithography, Santa Clara, CA
PY  - 2001
TI  - Interferometric Testing of Photomask Blank Flatness
ER  -