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Hunting the Origins of Line Width Roughness with Chemical Force Microscopy

Published

Author(s)

John T. Woodward IV, Jeeseong Hwang, V A. Prabhu
Proceedings Title
2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics
Conference Dates
March 27-29, 2007
Conference Location
Gaithersburg, MD
Conference Title
Proc. of the 2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics, AIP Conf. Vol. 931

Citation

Woodward, J. , Hwang, J. and Prabhu, V. (2007), Hunting the Origins of Line Width Roughness with Chemical Force Microscopy, 2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics , Gaithersburg, MD (Accessed June 13, 2024)

Issues

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Created January 1, 2007, Updated February 17, 2017