Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

High Throughput Methods for Materials R&D: A Growing Effort at NIST

Published

Author(s)

Leonid A. Bendersky, J D. Hewes

Abstract

The U.S. private sector has indicated that the National Institute of Standards and Technology has a role to play in facilitating the implementation of high throughput experimentation, for example using combinatorial methods. The Advanced Technology Program (ATP) is currently funding research projects in high throughput discovery of catalysts, electronic materials, and polymer coatings internally and externally to NIST. The NIST Measurement and Standards Laboratories is actively pursuing research in electronic materials and organic polymers. This presentation presents details on these efforts at the National Institute of Standards and Technology.
Citation
Applied Surface Science
Volume
189
Issue
No. 3-4

Keywords

combinatorial, high throughput screening

Citation

Bendersky, L. and Hewes, J. (2002), High Throughput Methods for Materials R&D: A Growing Effort at NIST, Applied Surface Science (Accessed October 9, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 1, 2002, Updated February 17, 2017