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High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films
Published
Author(s)
Peter K. Schenck, Debra L. Kaiser, Albert Davydov
Abstract
Compositionally graded combinatorial films have been characterized by a high throughput automated spectroscopic reflectometer. The data from this instrument were used to map the thickness and index of refraction of the compositionally varying films. Combinatorial films produced by dual-beam dual target pulsed laser deposition and characterized with the reflectometer include the BaTiO3-Sr TiO3 system on silicon (dielectric and ferroelectric films). In addition, combinatorial Au/Ni electrical contacts on a n-GaN/sapphire produced by e-beam vaporization have been characterized with the spectroscopic reflectometer. The Au/Ni/n-GaN/sapphire structures were characterized both as-deposited and after annealing at 400 C for 60s in flowing argon.
Citation
Applied Surface Science
Volume
223
Issue
No. 1-3
Pub Type
Journals
Keywords
combinatorial, opltical properties, reflectometry, thin films
Schenck, P.
, Kaiser, D.
and Davydov, A.
(2004),
High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films, Applied Surface Science
(Accessed December 6, 2023)