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High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films

Published

Author(s)

Peter K. Schenck, Debra L. Kaiser, Albert Davydov

Abstract

Compositionally graded combinatorial films have been characterized by a high throughput automated spectroscopic reflectometer. The data from this instrument were used to map the thickness and index of refraction of the compositionally varying films. Combinatorial films produced by dual-beam dual target pulsed laser deposition and characterized with the reflectometer include the BaTiO3-Sr TiO3 system on silicon (dielectric and ferroelectric films). In addition, combinatorial Au/Ni electrical contacts on a n-GaN/sapphire produced by e-beam vaporization have been characterized with the spectroscopic reflectometer. The Au/Ni/n-GaN/sapphire structures were characterized both as-deposited and after annealing at 400 C for 60s in flowing argon.
Citation
Applied Surface Science
Volume
223
Issue
No. 1-3

Keywords

combinatorial, opltical properties, reflectometry, thin films

Citation

Schenck, P. , Kaiser, D. and Davydov, A. (2004), High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films, Applied Surface Science (Accessed June 23, 2024)

Issues

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Created January 1, 2004, Updated February 19, 2017