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Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources

Published

Author(s)

W Zagozdzon-wosik, K Korablev, I Rusakova, David S. Simons, J H. Shi, P Chi, J C. Wolfe
Citation
Journal of the Electrochemical Society
Volume
143

Citation

Zagozdzon-wosik, W. , Korablev, K. , Rusakova, I. , Simons, D. , Shi, J. , Chi, P. and Wolfe, J. (1996), Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources, Journal of the Electrochemical Society (Accessed March 28, 2024)
Created November 30, 1996, Updated October 12, 2021