Zagozdzon-wosik, W.
, Korablev, K.
, Rusakova, I.
, Simons, D.
, Shi, J.
, Chi, P.
and Wolfe, J.
(1996),
Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources, Journal of the Electrochemical Society
(Accessed December 14, 2024)
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Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources
Published
Author(s)
W Zagozdzon-wosik, K Korablev, I Rusakova, , J H. Shi, , J C. Wolfe
Citation
Journal of the Electrochemical Society
Volume
143
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 30, 1996, Updated October 12, 2021