Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources

Published

Author(s)

W Zagozdzon-wosik, K Korablev, I Rusakova, David S. Simons, J H. Shi, P Chi, J C. Wolfe
Citation
Journal of the Electrochemical Society
Volume
143

Citation

Zagozdzon-wosik, W. , Korablev, K. , Rusakova, I. , Simons, D. , Shi, J. , Chi, P. and Wolfe, J. (1996), Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources, Journal of the Electrochemical Society (Accessed April 14, 2024)
Created November 30, 1996, Updated October 12, 2021