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Film quality in relation to deposition conditions of a-Si:H films deposited by the 'hot wire' method using highly diluted silane

Published

Author(s)

E C. Molenbroek, A H. Mahan, E J. Johnson, A C. Gallagher
Citation
Journal of Applied Physics
Volume
79

Citation

Molenbroek, E. , Mahan, A. , Johnson, E. and Gallagher, A. (1996), Film quality in relation to deposition conditions of a-Si:H films deposited by the 'hot wire' method using highly diluted silane, Journal of Applied Physics (Accessed May 5, 2024)
Created January 1, 1996, Updated February 17, 2017