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Features of Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnets Deposited on Obliquely Sputtered Ta Underlayers

Published

Author(s)

Alexander J. Shapiro, V S. Gornakov, Valerian I. Nikitenko, Robert D. McMichael, William F. Egelhoff Jr., Y W. Tahk, Robert D. Shull, L Gan

Abstract

Obliquely sputtered Ta underlayers were used to stabilize antiferromagnetically couple Co/Ru/Co/Ta structures with a strong uniaxial anistropy. Magneto-optical indicator film (MOIF) imaging revealed nucleation and growth of domains during remagnetization. For 0.5 nm Ru thickness and 10.6 nm Ta thickness, the top film magnetization is canted 82 from bottom film. The canting is attributed to ferromagnetic coupling through pinholes.
Citation
Journal of Magnetism and Magnetic Materials
Volume
240
Issue
No. 1-3

Keywords

magnetic domains, magnetic imaging, synthetic antiferromagnets

Citation

Shapiro, A. , Gornakov, V. , Nikitenko, V. , McMichael, R. , Egelhoff, W. , Tahk, Y. , Shull, R. and Gan, L. (2002), Features of Domain Nucleation and Growth in Co/Ru/Co Synthetic Antiferromagnets Deposited on Obliquely Sputtered Ta Underlayers, Journal of Magnetism and Magnetic Materials (Accessed April 16, 2024)
Created February 1, 2002, Updated February 17, 2017