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Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by DRIE and Bottom-up Au Electroplating

Published

Author(s)

Daniel Josell, Thomas P. Moffat

Abstract

Precisely aligned optical components are crucial prerequisites for X-ray tomography at high resolution. We propose a device with a fractal pattern for precise automatic focusing. The device is etched in a Si substrate by deep reactive ion etching and then filled by a self-terminating bottom-up Au electroplating process. The fractal nature of the device produces a globally homogeneous transmission X-ray image with high local contrast for pixels sizes in the range of 0.165 µm to 11 µm, while the high absorption contrast provided between Au and Si enables its use for X-ray energies ranging from 12 keV to 40 keV.
Citation
Applied Optics

Keywords

imaging, gold, electrodeposition, fractal, grating

Citation

Josell, D. and Moffat, T. (2022), Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by DRIE and Bottom-up Au Electroplating, Applied Optics, [online], https://doi.org/10.1364/AO.456427, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=934297 (Accessed June 13, 2024)

Issues

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Created April 26, 2022, Updated January 25, 2023