Josell, D.
and Moffat, T.
(2022),
Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by DRIE and Bottom-up Au Electroplating, Applied Optics, [online], https://doi.org/10.1364/AO.456427, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=934297
(Accessed October 9, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by DRIE and Bottom-up Au Electroplating
Published
Author(s)
,
Abstract
Precisely aligned optical components are crucial prerequisites for X-ray tomography at high resolution. We propose a device with a fractal pattern for precise automatic focusing. The device is etched in a Si substrate by deep reactive ion etching and then filled by a self-terminating bottom-up Au electroplating process. The fractal nature of the device produces a globally homogeneous transmission X-ray image with high local contrast for pixels sizes in the range of 0.165 µm to 11 µm, while the high absorption contrast provided between Au and Si enables its use for X-ray energies ranging from 12 keV to 40 keV.Citation
Applied Optics
Pub Type
Journals
Download Paper
Keywords
imaging, gold, electrodeposition, fractal, grating
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created April 26, 2022, Updated January 25, 2023