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FABRICATION AND CHARACTERIZATION OF STANDARDS FOR ATOMIC FORCE MICROSCOPE TIP WIDTH CALIBRATION

Published

Author(s)

Ronald G. Dixson, Craig D. McGray, Boon Ping Ng, Ndubuisi G. Orji, Jon C. Geist

Abstract

The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional surface sensing to enable scanning of features with near-vertical sidewalls. A major source of uncertainty in metrology with CD-AFM metrology is the calibration of the tip width. With a new generation of the NIST single crystal critical dimension reference material (SCCDRM) project, we are hoping to reach expanded uncertainties (k = 2) below 1 nm.
Citation
Abstract book for Frontier Conference

Keywords

AFM, linewidth, SCCDRM, lattice-selective etch, standard
Created March 25, 2013, Updated February 19, 2017