Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Etch induced microwave losses in titanium nitride superconducting resonators

Published

Author(s)

Martin O. Sandberg, Jeffrey S. Kline, Martin P. Weides, David S. Wisbey, David P. Pappas

Abstract

We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on silicon wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers, the reactive etched resonators showed low internal loss, whereas the ion- milled samples showed dramatically higher loss. At single-photon powers, we found that the fluorine- etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re- deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators.
Citation
Applied Physics Letters
Volume
100
Issue
26

Keywords

etch, low loss, superconducting resonator, Titanium Nitride

Citation

Sandberg, M. , Kline, J. , Weides, M. , Wisbey, D. and Pappas, D. (2012), Etch induced microwave losses in titanium nitride superconducting resonators, Applied Physics Letters, [online], https://doi.org/10.1063/1.4729623 (Accessed February 25, 2024)
Created June 25, 2012, Updated November 10, 2018