Etch induced microwave losses in titanium nitride superconducting resonators

Published

June 25, 2012

Author(s)

Martin O. Sandberg, Jeffrey S. Kline, Martin P. Weides, David S. Wisbey, David P. Pappas

Abstract

We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on silicon wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers, the reactive etched resonators showed low internal loss, whereas the ion- milled samples showed dramatically higher loss. At single-photon powers, we found that the fluorine- etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re- deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators.

Citation

Applied Physics Letters

Volume

100

Issue

26

Pub Type

Journals

Download Paper

https://doi.org/10.1063/1.4729623

Keywords

etch, low loss, superconducting resonator, Titanium Nitride

Citation

Sandberg, M. , Kline, J. , Weides, M. , Wisbey, D. and Pappas, D. (2012), Etch induced microwave losses in titanium nitride superconducting resonators, Applied Physics Letters, [online], https://doi.org/10.1063/1.4729623 (Accessed October 17, 2025)