Campos, F.
, Weaver, G.
, Waltman, C.
and Leone, S.
(1992),
Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV, Journal of Vacuum Science and Technology B
(Accessed December 1, 2024)
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Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
Published
Author(s)
F X. Campos, G C. Weaver, C J. Waltman,
Citation
Journal of Vacuum Science and Technology B
Volume
10
Pub Type
Journals
Citation
Issues
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Created December 31, 1991, Updated October 12, 2021