@article{799001,
  author = {F Campos and G Weaver and C Waltman and S Leone},
  title = {Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV},
  year = {1992},
  number = {10},
  month = {1992-01-01 00:01:00},
  publisher = {Journal of Vacuum Science and Technology B},
  language = {en},
}