Herzing, A.
, Guler, U.
, Zhou, X.
, Boltasseva, A.
, Shalaev, V.
and Norris, T.
(2016),
Electron Energy Loss Characterization of Plasmonic Resonance Characteristics of Titanium Nitride Thin Films, Applied Physics Letters, [online], https://doi.org/10.1063/1.4947442
(Accessed January 21, 2025)
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Electron Energy Loss Characterization of Plasmonic Resonance Characteristics of Titanium Nitride Thin Films
Published
Author(s)
, Urcan Guler, Xiuli Zhou, Alexandra Boltasseva, Vladimir Shalaev, Theodore Norris
Abstract
The plasmon resonance characteristics of refractory TiN thin-films has been analyzed using electron energy-loss spectroscopy (EELS). A bulk resonance was observed at 2.81 eV loss and a weaker surface resonance peak was detected at 2.05 eV. These findings were compared to optical simulations which showed strong agreement with the bulk value resonance. In contrast, the calculated surface resonance was located at 2.3 eV, which is significantly higher than that observed experimentally. Since no local chemical variations were detected via EELS, the discrepancy between the measured and simulated values is ascribed to a variation in carrier concentration, possibly due to interaction with the underlying MgO substrate.Citation
Applied Physics Letters
Pub Type
Journals
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Keywords
STEM , Plasmonics , EELS , Nanocharacterization
Citation
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Created April 29, 2016, Updated October 28, 2022