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Effects of Wafer Impedance on the Monitoring and Control of Ion Energy in Plasma Reactors

Published

Author(s)

Mark A. Sobolewski
Citation
Journal of Applied Physics
Volume
100
Issue
6

Citation

Sobolewski, M. (2006), Effects of Wafer Impedance on the Monitoring and Control of Ion Energy in Plasma Reactors, Journal of Applied Physics (Accessed July 24, 2024)

Issues

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Created September 15, 2006, Updated February 17, 2017