Chen, D.
, DeWitt, D.
, Kreider, K.
, Tsai, B.
and Kimes, W.
(2002),
Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement, RTP 2002 , Vancouver, 1, CA
(Accessed May 11, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement
Published
Author(s)
D H. Chen, , K G. Kreider, , W A. Kimes
Proceedings Title
RTP 2002
Conference Dates
April 18, 2002
Conference Location
Vancouver, 1, CA
Conference Title
Proc. 10^uth^ IEEE International Conference on Advanced Thermal Processing
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2001, Updated October 12, 2021