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Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement

Published

Author(s)

D H. Chen, D P. DeWitt, K G. Kreider, Benjamin K. Tsai, W A. Kimes
Proceedings Title
RTP 2002
Conference Dates
April 18, 2002
Conference Location
Vancouver, 1, CA
Conference Title
Proc. 10^uth^ IEEE International Conference on Advanced Thermal Processing

Citation

Chen, D. , DeWitt, D. , Kreider, K. , Tsai, B. and Kimes, W. (2002), Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement, RTP 2002 , Vancouver, 1, CA (Accessed May 4, 2024)
Created December 31, 2001, Updated October 12, 2021