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Effects of Noise Level in Fitting In-Situ Optical Reflectance Spectroscopy Data

Published

Author(s)

Chih-chiang Fu, Kristine A. Bertness, Chih-Ming Wang

Abstract

We discuss the combination of noise level and scaling factor accuracy needed in optical reflectance spectroscopy data in order to obtain accurate parameters by fitting simulated Optical Reflectance Spectroscopy data curves with different noise level.
Proceedings Title
Proc., MBE XII - International Conference on Molecular Beam Epitaxy
Conference Dates
September 15-20, 2002
Conference Location
San Francisco, CA, USA

Keywords

data, in-situ, optical, reflectance, spectroscopy

Citation

Fu, C. , Bertness, K. and Wang, C. (2002), Effects of Noise Level in Fitting In-Situ Optical Reflectance Spectroscopy Data, Proc., MBE XII - International Conference on Molecular Beam Epitaxy, San Francisco, CA, USA (Accessed February 27, 2024)
Created August 31, 2002, Updated October 12, 2021