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Development and Characterization of Insulating Layers on Silicon Carbide: Annual Report for Feb. 14, 1988 to Feb. 14, 1989

Published

Author(s)

Joseph Kopanski, Donald B. Novotny
Citation
NIST Interagency/Internal Report (NISTIR) -

Citation

Kopanski, J. and Novotny, D. (1989), Development and Characterization of Insulating Layers on Silicon Carbide: Annual Report for Feb. 14, 1988 to Feb. 14, 1989, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD (Accessed April 14, 2024)
Created August 31, 1989, Updated October 12, 2021