Seah, M.
, Spencer, S.
, Bensebaa, F.
, Vickridge, I.
, Danzebrink, H.
, Krumrey, M.
, Gross, T.
, Oesterle, W.
, Wendler, E.
, Rheinlander, B.
, Azuma, Y.
, Kojima, I.
, Suzuki, N.
, Suzuki, M.
, Tanuma, S.
, Moon, D.
, Lee, H.
, Cho, H.
, Chen, H.
, Wee, A.
, Osipowicz, T.
, Pan, J.
, Jordaan, W.
, Hauert, R.
, Klotz, U.
, van der marel, C.
, Verheijen, M.
, Tamminga, Y.
, Jeynes, C.
, Bailey, P.
, Biswas, S.
, Falke, U.
, Nguyen, N.
, Chandler-Horowitz, D.
, Ehrstein, J.
, Muller, D.
and Dura, J.
(2004),
Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study, Surface and Interface Analysis
(Accessed April 19, 2024)
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Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study
Published
Author(s)
M P. Seah, S J. Spencer, F Bensebaa, I Vickridge, H Danzebrink, Michael Krumrey, T Gross, W Oesterle, E Wendler, B Rheinlander, Yasushi Azuma, I Kojima, N Suzuki, M Suzuki, Shigeo Tanuma, D W. Moon, Hansuek Lee, H Cho, H Y. Chen, A T. Wee, T Osipowicz, J S. Pan, W A. Jordaan, R Hauert, U Klotz, C van der marel, M Verheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, , , , D Muller,
Citation
Surface and Interface Analysis
Volume
36
Pub Type
Journals
Citation
Created September 30, 2004, Updated October 12, 2021