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Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study

Published

Author(s)

M P. Seah, S J. Spencer, F Bensebaa, I Vickridge, H Danzebrink, Michael Krumrey, T Gross, W Oesterle, E Wendler, B Rheinlander, Yasushi Azuma, I Kojima, N Suzuki, M Suzuki, Shigeo Tanuma, D W. Moon, Hansuek Lee, H Cho, H Y. Chen, A T. Wee, T Osipowicz, J S. Pan, W A. Jordaan, R Hauert, U Klotz, C van der marel, M Verheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, Nhan Van Nguyen, Deane Chandler-Horowitz, James R. Ehrstein, D Muller, Joseph Dura
Citation
Surface and Interface Analysis
Volume
36

Citation

Seah, M. , Spencer, S. , Bensebaa, F. , Vickridge, I. , Danzebrink, H. , Krumrey, M. , Gross, T. , Oesterle, W. , Wendler, E. , Rheinlander, B. , Azuma, Y. , Kojima, I. , Suzuki, N. , Suzuki, M. , Tanuma, S. , Moon, D. , Lee, H. , Cho, H. , Chen, H. , Wee, A. , Osipowicz, T. , Pan, J. , Jordaan, W. , Hauert, R. , Klotz, U. , van der marel, C. , Verheijen, M. , Tamminga, Y. , Jeynes, C. , Bailey, P. , Biswas, S. , Falke, U. , Nguyen, N. , Chandler-Horowitz, D. , Ehrstein, J. , Muller, D. and Dura, J. (2004), Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study, Surface and Interface Analysis (Accessed February 25, 2024)
Created September 30, 2004, Updated October 12, 2021