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Comparison of On-Wafer Calibrations

Published

Author(s)

Dylan F. Williams, Roger Marks, A. Davidson

Abstract

A powerful new verification technique determines the measurement accuracy of scattering parameter calibrations. The technique determines the relative reference impedance, reference plane offset, and the worst-case measurement deviations of any calibration from a benchmark calibration. The technique is applied to several popular on-wafer scattering parameter calibrations, and the deviations between those calibrations and the thru-reflect line calibration are quantified.
Proceedings Title
Tech Dig., Auto. RF Tech. Group Conf.
Volume
20
Conference Location
San Diego, CA

Citation

Williams, D. , Marks, R. and Davidson, A. (1991), Comparison of On-Wafer Calibrations, Tech Dig., Auto. RF Tech. Group Conf., San Diego, CA, [online], https://doi.org/10.1109/ARFTG.1991.324040 (Accessed April 16, 2024)
Created December 1, 1991, Updated November 10, 2018