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PUBLICATIONS

Comparative Thickness Measurements of SiO2/Si Films for Thicknesses Less than 10 nm

Published

Author(s)

Terrence J. Jach, Joseph Dura, Nhan Van Nguyen, J Swider, G Cappello, Curt A. Richter
Citation
Surface and Interface Analysis
Volume
36
Issue
1
Pub Type
Journals

Citation

Jach, T. , Dura, J. , Nguyen, N. , Swider, J. , Cappello, G. and Richter, C. (2004), Comparative Thickness Measurements of SiO<sub>2</sub>/Si Films for Thicknesses Less than 10 nm, Surface and Interface Analysis (Accessed December 10, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2003, Updated October 12, 2021