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Comparative Thickness Measurements of SiO2/Si Films for Thicknesses Less than 10 nm

Published

Author(s)

Terrence J. Jach, Joseph Dura, Nhan Van Nguyen, J Swider, G Cappello, Curt A. Richter
Citation
Surface and Interface Analysis
Volume
36
Issue
1

Citation

Jach, T. , Dura, J. , Nguyen, N. , Swider, J. , Cappello, G. and Richter, C. (2004), Comparative Thickness Measurements of SiO<sub>2</sub>/Si Films for Thicknesses Less than 10 nm, Surface and Interface Analysis (Accessed August 12, 2022)
Created December 31, 2003, Updated October 12, 2021