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Combinatorial study of the crystallinity boundary in the HfO2-TiO2-Y2O3 system using pulsed laser deposition library thin films
Published
Author(s)
Peter K. Schenck, Jennifer L. Klamo, Nabil Bassim, Peter G. Burke, Yvonne B. Gerbig, Martin L. Green
Abstract
HfO2-TiO2-Y2O3 is an interesting high-k dielectric system. Combinatorial library films of this system enable the study of the role of composition on phase formation as well as optical and mechanical properties. A library film of this system deposited at 400ºC exhibited a boundary line evident visually as well as in optical characterization. Mapping x-ray analysis showed the line corresponds to a crystallinity boundary, separating an amorphous phase and a FCC crystalline phase of yttrium hafnium oxide. Mapping nanoindentation across the boundary also revealed a sharp change in mechanical properties. The combinatorial technique is a powerful tool for high-throughput materials science, and by realizing this particularly unique PLD library film, allows many interesting materials phenomena and properties to be measured.
Schenck, P.
, Klamo, J.
, Bassim, N.
, Burke, P.
, Gerbig, Y.
and Green, M.
(2008),
Combinatorial study of the crystallinity boundary in the HfO2-TiO2-Y2O3 system using pulsed laser deposition library thin films, Thin Solid Films, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853610
(Accessed October 14, 2025)