Combinatorial study of the crystallinity boundary in the HfO2-TiO2-Y2O3 system using pulsed laser deposition library thin films

Published

May 16, 2008

Author(s)

Peter K. Schenck, Jennifer L. Klamo, Nabil Bassim, Peter G. Burke, Yvonne B. Gerbig, Martin L. Green

Abstract

HfO2-TiO2-Y2O3 is an interesting high-k dielectric system.  Combinatorial library films of this system enable the study of the role of composition on phase formation as well as optical and mechanical properties.  A library film of this system deposited at 400ºC exhibited a boundary line evident visually as well as in optical characterization.  Mapping x-ray analysis showed the line corresponds to a crystallinity boundary, separating an amorphous phase and a FCC crystalline phase of yttrium hafnium oxide.  Mapping nanoindentation across the boundary also revealed a sharp change in mechanical properties.  The combinatorial technique is a powerful tool for high-throughput materials science, and by realizing this particularly unique PLD library film, allows many interesting materials phenomena and properties to be measured.

Citation

Thin Solid Films

Volume

517

Pub Type

Journals

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Keywords

Combinatorial, Thin films, Reflectometry, X-ray diffraction, Nanoindentation

Citation

Schenck, P. , Klamo, J. , Bassim, N. , Burke, P. , Gerbig, Y. and Green, M. (2008), Combinatorial study of the crystallinity boundary in the HfO2-TiO2-Y2O3 system using pulsed laser deposition library thin films, Thin Solid Films, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853610 (Accessed December 5, 2024)