Skip to main content

NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

CMOS Process Monitor

Published

Author(s)

M. G. Buehler, Loren W. Linholm, V. C. Tyree, Richard A. Allen, B. R. Blaes, K. A. Hicks, G. A. Jennings
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Issue
6
Conference Dates
February 22-23, 1988
Conference Location
Long Beach, CA, USA

Citation

Buehler, M. , Linholm, L. , Tyree, V. , Allen, R. , Blaes, B. , Hicks, K. and Jennings, G. (1988), CMOS Process Monitor, Proc., IEEE International Conference on Microelectronic Test Structures, Long Beach, CA, USA (Accessed October 20, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1988, Updated October 12, 2021
Was this page helpful?