Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Characterizing a Scatterfield Optical Platform for Semiconductor Metrology

Published

Author(s)

Bryan M. Barnes, Ravikiran Attota, Richard Quintanilha, Martin Y. Sohn, Richard M. Silver

Abstract

Scatterfield microscopy is the union of a high-magnification imaging platform and the angular and/or wavelength control of scatterometry at the sample surface. Scatterfield microscopy uses Köhler illumination, where each point on the source translates to a particular angle of illumination yet also yields spatial illumination homogeneity. To apply scatterfield microscopy to quantitative metrology, several aspects of the optical column must be well-understood. Characterizations are presented of the illumination intensity, angle, polarization, and measured glare as functions of the position of an aperture in the conjugate to the back focal plane (CBFP) of the objective lens. The characterization of a reference sample is shown to be as important as the inspection of other optical elements in the optical column. Reflectivity can be derived for line arrays lacking diffractive orders by measuring such a reference and deriving a “tool function” to account for the current state of the optical platform. Examples from defect, critical dimension, and overlay metrologies are presented to demonstrate the necessity of characterization for scatterfield microscopy.
Citation
Measurement Science & Technology
Volume
22

Keywords

scatterfield microscopy, Köhler illumination, microscope characterization, semiconductor metrology

Citation

Barnes, B. , Attota, R. , Quintanilha, R. , Sohn, M. and Silver, R. (2010), Characterizing a Scatterfield Optical Platform for Semiconductor Metrology, Measurement Science & Technology, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905931 (Accessed July 15, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 21, 2010, Updated February 19, 2017